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针对柱状晶薄膜 ,建立了异常晶粒生长理论模型 .指出薄膜中的晶粒生长 ,除像传统的整体材料中的晶粒生长一样考虑晶界能外 ,还应当考虑表面能、界面能和应变能 .对能量的各向异性进行了回顾性分析 .从表面能的最小化考虑 ,面心立方和体心立方薄膜的择优取向或织构应分别为 ( 111)和 ( 110 ) ;而从应变能的最小化考虑 ,面心立方和体心立方薄膜的择优取向或织构应分别为 ( 110 )和 ( 10 0 )
Aiming at the columnar crystal thin film, a theoretical model of abnormal grain growth is established. It is pointed out that the grain growth in the thin film should consider the surface energy, interfacial energy and strain, in addition to considering the grain boundary energy as the grain growth in the traditional monolithic material. The energy anisotropy was analyzed retrospectively.From the minimization of surface energy, the preferred orientation or texture of face centered cubic and body centered cubic thin films should be (111) and (110), respectively, To minimize the energy, the preferred orientation or texturing of face-centered cubic and body-centered cubic films should be (110) and (10)