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用红外椭圆偏振仪对热丝化学气相沉积法制备的金刚石薄膜的光学参量进行了测量。由于表面状态和界面特性的差异 ,分别对镜面抛光硅片和粗糙氧化铝基片上的金刚石薄膜建立了不同的模型 ,并在此基础上进行了测试结果的计算拟合。为了综合反应诸如表面粗糙度等表面界面因素对测试结果的影响 ,根据衬底特性将表面层和界面层分离出来 ,并采用Bruggeman有效介质方法对它们的影响进行了近似处理。结果表明 ,硅衬底上金刚石薄膜的椭偏数据在模型引入了厚度为 879nm的表面粗糙层之后能得到很好的拟合。而对于氧化铝衬底上的金刚石薄膜而言 ,除了在薄膜表面引入了粗糙层之外 ,还必须在衬底和金刚石界面处加入一层由体积分数为 0 641的氧化铝、体积分数为 0 2 3 3 4的金刚石和体积分数为 0 12 53的空隙组成的复合过渡层 (厚度 995nm ) ,才能使计算值与实验参量很好地吻合。
The optical parameters of diamond films prepared by hot filament chemical vapor deposition were measured with an infrared ellipsometer. Due to the difference of the surface state and interface characteristics, different models were established for the diamond films on the mirror-polished silicon wafer and the rough alumina substrate, respectively, and the calculation results were calculated on the basis of this. In order to comprehensively reflect the influence of the surface interface such as surface roughness on the test results, the surface layer and the interface layer are separated according to the substrate characteristics, and their effects are approximated by using the Bruggeman effective medium method. The results show that the ellipsometric data of the diamond films on silicon substrate can be well fitted after the model is introduced with a surface roughness of 879 nm in thickness. For the diamond film on the alumina substrate, in addition to the introduction of a rough layer on the surface of the film, it is also necessary to add a layer of alumina with a volume fraction of 0,641 at the interface between the substrate and the diamond, with a volume fraction of 0 2 3 3 4 diamond and volume fraction of 0 12 53 of the composite gap layer (thickness 995nm), in order to make the calculated value and experimental parameters well fit.