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采用ＨＮ３·Ｈ２Ｏ－ＮＨ４Ｃｌ体系，在氧化剂（ＮＨ４）２Ｓ２Ｏ８存在下，可在较低的温度下进行黄铜矿的浸取。在选定的条件下，一次浸取可浸出２５％～３０％的铜。一般四次浸取，即可浸取完全。
Using HN3 · H2O-NH4Cl system, in the presence of oxidant (NH4) 2S2O8, the leaching of chalcopyrite can be performed at a lower temperature. Under the selected conditions, a leaching can leach 25% to 30% of copper. Generally four leaching, you can leach completely.