论文部分内容阅读
第四届全国半导体物理学术会议于1983年11月27至30日在南京召开,本届会议由南京大学和南京固体器件研究所负责筹办。会议代表来自全国42所高等院校、17个研究所和7个工厂共66个单位189名代表。其中有著名的半导体物理学家黄昆,谢希德等知名教授。 全国半导体物理学术会议是半导体物理界两年一度的盛会,本届会议就是近二年来半导体物理研究工作的汇报和检阅。黄昆和谢希德同志分别在开幕式和闭幕式上作了题为“聚乙炔半导体”和“半导体物理的某些新进展”的特邀报告。两个报告均受到与会者的热烈欢迎。聚乙炔半导体是一种新型高分子半导体材料,它的出现在国际上引起了极大的兴趣。黄昆教授结合自己的工作,深入浅出地介绍了这种新型半导体及目前的研究水平。谢希德教授介绍了半导体物理研究的一些最新进展,包括半导体表面和界面,肖特基势垒和异质结界面,量
The 4th National Conference on Semiconductor Physics was held in Nanjing from November 27 to November 30, 1983, and was organized by Nanjing University and Nanjing Institute of Solid Devices. The conference delegates from 189 universities and colleges, 17 institutes and 7 factories a total of 66 units 189 representatives. Among them, well-known semiconductor physicists Huang Kun, Xie Xide and other famous professors. National Semiconductor Physics Conference is the semiconductor physics biennial event, this session is the past two years, semiconductor physics research report and review. Huang Kun and Xie Xide made a special report titled “Polyacetylene Semiconductor” and “Some New Advances in Semiconductor Physics” respectively at the opening ceremony and the closing ceremony. Both reports were warmly welcomed by participants. Polyacetylene semiconductor is a new type of polymer semiconductor material, its appearance has aroused great interest in the world. Professor Huang Kun combined his work, explain profound theories in simple language to introduce this new type of semiconductor and the current research level. Professor Xie Xide introduced some recent advances in semiconductor physics research, including the semiconductor surface and interface, Schottky barrier and heterojunction interface, the amount of