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采用脉冲激光沉积法(PLD)在单晶硅基底上制备了WSx固体润滑薄膜。利用X射线能谱仪(EDS)、扫描电子显微镜(SEM)、X射线衍射仪(XRD)对薄膜的成分、形貌和微观结构进行了分析,采用球盘式磨损试验机在大气(相对湿度为50%～55%)环境下评价薄膜的摩擦学特性。结果表明:薄膜中S和W的原子数分数比(简称S/W比)在1.05～3.75之间可控,摩擦系数为0.1～0.2;S/W比高于2.0时薄膜成膜质量和摩擦系数显著恶化。正交试验法得出影响薄膜S/W比的因素主次顺序分别是气压、温度、靶基距和激光通量;最优工艺参数是温度150℃、靶基距45mm、激光通量5J/cm2、气压1Pa,可获得结构致密、成分接近化学计量比的WSx薄膜。
WSx solid lubricant films were prepared on single crystal silicon substrates by pulsed laser deposition (PLD). The composition, morphology and microstructure of the films were analyzed by X-ray photoelectron spectroscopy (EDS), scanning electron microscopy (SEM) and X-ray diffraction (XRD) 50% ~ 55%) environment tribological properties of the film evaluation. The results showed that the atomic ratio of S and W (S / W ratio) was controlled between 1.05 and 3.75 and the friction coefficient was 0.1 ~ 0.2. The film quality and friction The coefficient is significantly worse. Orthogonal test method to determine the factors that affect the film S / W ratio order was pressure, temperature, the base distance and laser flux; the optimum process parameters are the temperature 150 ℃, the target base distance 45mm, the laser flux 5J / cm2, pressure 1Pa, to obtain a compact structure, composition close to the stoichiometric WSx film.