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Diamond thin films have been formed by plasma chemical vapordeposition from methane(CH_4)and hydrogen(H_2)mixed gases on silicon andquartz substrates.The films deposited under suitable conditions have goodcrystallity measured by SEM,X-ray diffraction and Raman spectra.The con-centration of methane is one of important parameters in depositing diamondfilms.The deposition rate is given.
Diamond thin films have been formed by plasma chemical vapor deposition from methane (CH 4) and hydrogen (H 2) mixed gases on silicon and quartz substrates. The films deposited under suitable conditions have good crystallographic measured by SEM, X-ray diffraction and Raman spectra The con- centration of methane is one of important parameters in depositing diamondfilms. deposition rate is given.