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年轻的集成电路技术,其技术革新快,并且经济效果大。目前人们正以片子的大型化和图形的微细化手段提高集成度,追求其经济效果。本文叙述一下卡诺公司为实现最经济的2微米掩模对准技术而研制的“卡诺PLA-500FA”设备。该设备的优点在于能使接近式、软接触式、接触式三种曝光方式互相转换,能根据所需要的分辨率选择曝光方式。此外,又由于采用深紫外线光源,选择接近式能曝光2微米的线条,选用接触式能曝光亚微米图形。再者,设备上还装有激光束扫描的高精度检测自动对准系统。程序控制采用微电子计算机,从而提高了可靠性和保证系统的运
Young integrated circuit technology, its technological innovation fast, and the economic effect. At present, people are increasing the degree of integration and pursuing their economic effects by making the films larger and the graphics miniaturized. This article describes Carnot's “Carnot PLA-500FA” device, developed for the most economical 2-micron mask alignment. The device has the advantage of enabling proximity, soft touch, touch three kinds of exposure to each other conversion, according to the resolution you need to choose the exposure method. In addition, due to the use of deep UV light source, the choice of proximity can be exposed 2-micron lines, the choice of contact exposure to sub-micron graphics. In addition, the device is also equipped with laser beam scanning of high-precision automatic alignment system. Program control using microelectronic computers, thereby enhancing the reliability and ensure the system shipped