论文部分内容阅读
以镀有Ti层的Al2O3为衬底,在微波等离子体化学气相沉积系统中,以CH4和H2为反应气体,快速制备了链状碳纳米管薄膜(沉积时间仅1 min)。通过SEM、TEM和Raman光谱观察了薄膜的表面形貌,分析了薄膜的微观结构。在高真空室中测试了薄膜场发射特性,其开启电场为0.81 V/μm,在3.15 V/μm电场下,其场发射电流密度达到9 mA/cm2,发射稳定,是一种良好的电子发射体。
In the microwave plasma chemical vapor deposition system, a thin film of carbon nanotubes (deposition time of only 1 min) was prepared rapidly by using Al 2 O 3 as a substrate coated with Ti layer by using CH 4 and H 2 as reaction gases. The surface morphology of the film was observed by SEM, TEM and Raman spectroscopy, and the microstructure of the film was analyzed. The field emission characteristics of the thin films were tested in a high vacuum chamber with an on-field of 0.81 V / μm and a field emission current density of 9 mA / cm2 at 3.15 V / μm with a stable emission and a good electron emission body.