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利用直流磁控溅射法在室温玻璃衬底上制备出了可见光透过率高、电阻率低的铝锆共掺杂氧化锌(ZAZO)透明导电薄膜。讨论了溅射功率对ZAZO薄膜结构、形貌和光电性能的影响。实验结果表明,溅射功率对ZAZO薄膜的结构、形貌和电学性能有很大影响,而对其光学性能影响不大。扫描电子显微镜和X射线衍射仪研究结果表明,ZAZO薄膜为六方纤锌矿结构的多晶薄膜,具有垂直于衬底方向的c轴择优取向。当溅射功率为120 W时,薄膜的电阻率达到最小值5.28×10-4Ω.cm,其可见光区平均透过率超过94%。
The ZAZO transparent conductive thin film with high visible light transmittance and low resistivity was prepared by DC magnetron sputtering on a glass substrate at room temperature. The effect of sputtering power on the structure, morphology and photoelectric properties of ZAZO thin films was discussed. The experimental results show that the sputtering power has a great influence on the structure, morphology and electrical properties of ZAZO thin films, but has little effect on the optical properties. The results of SEM and XRD show that the ZAZO thin film is a polycrystalline thin film with hexagonal wurtzite structure and has a preferred c-axis orientation perpendicular to the substrate. When the sputtering power is 120 W, the resistivity of the film reaches the minimum of 5.28 × 10-4Ω.cm, and the average transmittance in visible light region exceeds 94%.