【摘 要】
:
利用“电子束蒸发沉积薄膜生长技术+离子束溅射沉积薄膜生长技术”、“HfO2/SiO2+Al2O3/SiO2+M-SiO2”复合光学膜系设计技术、400℃×4h高温处理技术,研制的SR-FEL宽带腔镜光学
【机 构】
:
中国科学院电子学研究所,中国原子能科学研究院,中国科学院电子学研究所,中国科学院电子学研究所 北京 100080,北京 102413,北京 100080,北京 100080
论文部分内容阅读
利用“电子束蒸发沉积薄膜生长技术+离子束溅射沉积薄膜生长技术”、“HfO2/SiO2+Al2O3/SiO2+M-SiO2”复合光学膜系设计技术、400℃×4h高温处理技术,研制的SR-FEL宽带腔镜光学膜系在355nm中心波长的绝对光学反射率测量值为R(355nm)=99.45%,反射光谱带宽测量值为Δλ(R≥99.00%)=75nm;研制的355nm/248nm双带腔镜光学膜系,在355nm中心波长,其绝对光学反射率测量值为R(355nm)=99.69%,反射光谱带宽测量值为Δλ(R≥99.00%)=59nm;在248nm中心波长, R(248nm)=98.21%,绝对光学反射率光谱带宽测量值Δλ(R≥99.00)=9mm,Δλ(R≥98.00%)=33nm.
Using “electron beam evaporation deposition thin film growth technology + ion beam sputtering deposition film growth technology”, “HfO2 / SiO2 + Al2O3 / SiO2 + M-SiO2” composite optical film design technology, 400 ℃ × 4h high temperature processing technology developed The absolute optical reflectance of the SR-FEL wide-band cavity mirror optical film measured at a central wavelength of 355 nm was R (355 nm) = 99.45% and the measured reflectance bandwidth was Δλ (R ≧ 99.00%) = 75 nm. The 355 nm / 248 nm double-cavity mirco optical film has an absolute optical reflectance of R (355 nm) = 99.69% and a reflection band width of Δλ (R ≥ 99.00%) at a 355 nm center wavelength. = 59 nm; R (248 nm) = 98.21% at 248 nm central wavelength, absolute optical reflectance spectral bandwidth measurement Δλ (R ≧ 99.00) = 9 mm, Δλ (R ≧ 98.00%) = 33 nm.
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