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一、前言低真空气相沉积金刚石薄膜的技术自从1951年在实验室向世以来，经过20多年的徘徊，终于在70年代末取得了突破性进展，低真空化学气相沉积金刚石薄膜的生长速度由每小时几个埃增加到每小时见微米，开始进入到工业应用的开发阶段。低真空化学气相．沉积法生产金刚石薄膜
I. Introduction Low vacuum vapor deposition of diamond film technology Since its inception in the laboratory in 1951, after more than 20 years of hovering, finally made a breakthrough in the late 70’s progress, low vacuum CVD diamond film growth rate from Hours a few angstroms to micrometers per hour, began to enter the industrial application development stage. Low vacuum chemical vapor phase. Deposition production of diamond film