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利用中频反应磁控溅射技术在1Cr18Ni9Ti不锈钢基底上沉积ZrN薄膜。通过控制N/Ar、溅射功率和基体偏压等参数,得到不同实验条件的ZrN膜层。通过对膜层颜色测量和AES分析,研究N分压强对ZrN膜层质量的影响。实验结果表明:工作气压0.3Pa,溅射功率5kW,基体偏压-150V、占空比50%等工艺参数一定的前提下,N分压强在不同的范围内,可以分别制备出视觉效果类似于18K、23K和纯金的氮化锆膜层。
ZrN thin films were deposited on 1Cr18Ni9Ti stainless steel by IF magnetron sputtering. By controlling the parameters of N / Ar, sputtering power and substrate bias, ZrN films with different experimental conditions were obtained. The effect of N partial pressure on the quality of ZrN film was studied by color measurement and AES analysis. The experimental results show that under the conditions of working pressure 0.3Pa, sputtering power 5kW, substrate bias -150V, duty cycle 50% and other process parameters are certain, the N partial pressure is in different range, and the visual effect can be prepared separately 18K, 23K and pure gold zirconium nitride film.