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消除芯片工作区中的有害杂质和缺陷,对于提高半导体器件和集成电路的性能或合格率具有非常重要的意义。国内外均在努力发展各种吸除技术。我所七室电子束退火工艺试验组开展了低能电子辐照吸除技术的探索。前已报道,我们对低频大功率管和高频小功率管芯片进行低能电子辐照取得了提高管芯合格率的初步结果。最近,我们在长沙晶体管厂的协助下进行了一批新的电子辐照吸除实验,采用改进的电子辐照方法,获得了较好的结果。
Elimination of harmful impurities and defects in the chip work area, for improving the performance of semiconductor devices and integrated circuits or pass rate is of great significance. At home and abroad are working hard to develop a variety of suction technology. Our seven-chamber electron beam annealing process experimental group to carry out low-energy electron radiation absorption technology exploration. It has been previously reported that preliminary results of improving die pass rates have been achieved by low-energy electron irradiation of low frequency high power tubes and high frequency low power tube chips. Recently, we carried out a series of new electron irradiation experiments with the assistance of the Changsha Transistor Plant. The improved electron irradiation method was used to obtain good results.