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磁控溅射靶面磁感应强度的水平分布直接关系到靶材的利用率和刻蚀的均匀性,为了寻求更好的磁控靶结构参数,从而实现靶面水平磁感应强度的均匀分布,本文应用COMSOL软件对JGP450C型磁控溅射镀膜机的圆平面靶表面磁感应强度进行了模拟分析计算,得到了靶面水平磁感应强度较强、分布较均匀的磁铁结构参数。
The horizontal distribution of the magnetic induction intensity of the magnetron sputtering target surface is directly related to the utilization ratio of the target material and the uniformity of the etching. In order to seek better magnetron target structure parameters and achieve uniform distribution of the magnetic flux density at the target surface, COMSOL software was used to simulate and calculate the magnetic induction intensity on the surface of JGP450C magnetron sputter coater. The magnetic parameters of the magnet with strong magnetic flux density and uniform distribution on the target surface were obtained.