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采用溶胶凝胶法合成ZrO2 SiO2 有机无机复合光波导材料,通过改变其中ZrO2 的含量来调节材料的折射率,使材料分别适用于平面光波导的导光层(ng≈1.497)和衬底层、包层(nb=nc≈1.479)。采用旋转涂膜工艺和相应的热处理,在单晶硅基片上制备衬底层、导光层和包层等薄膜,其中导光层介质因具有感光性而可通过紫外光刻来制备光路图案。所得有机无机复合ZrO2 SiO2 板型平面光波导(衬底层+导光层),用棱镜耦合截断法测试其光损耗在632.8 nm波长处约为0.8 dB/cm。对板型平面波导的导光层薄膜进行紫外光刻和异丙醇淋洗,制备出脊状光波导通道,在覆盖包层后,即获得埋层沟道式平面光波导。采用端耦合截断法测试了埋层沟道式平面光波导的光损耗(小于0.1dB/cm),并观察了其近场图像以及导光材料在近红外窗口的吸收光谱。
The ZrO2 SiO2 organic-inorganic composite optical waveguide material was prepared by sol-gel method. The refractive index of the material was adjusted by changing the content of ZrO2. The materials were respectively applied to the light guide layer (ng≈1.497) and the substrate layer of the planar optical waveguide Layer (nb = nc≈1.479). The spin coating process and the corresponding heat treatment are adopted to prepare the substrate layer, the light guiding layer and the cladding film on the monocrystalline silicon substrate, wherein the light guiding layer medium can be prepared by UV lithography to obtain the optical path pattern due to the photosensitive property. The resulting organic-inorganic composite ZrO2 SiO2 planar waveguide (substrate layer + light guide layer), the prism coupling truncation test its optical loss at 632.8 nm wavelength of about 0.8 dB / cm. The light guide layer film of the planar waveguide is subjected to ultraviolet photolithography and isopropanol rinsing to prepare a ridge-shaped optical waveguide channel. After covering the cladding layer, a buried channel-type planar optical waveguide is obtained. The optical loss (less than 0.1 dB / cm) of the buried channel planar optical waveguide was tested by the end-coupled truncation method. The near-infrared image and the near-infrared absorption spectrum of the waveguide were also observed.