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本文叙述了石英晶体监测膜厚方法的简单改进。在5～45微米膜厚范围内,在真空镀膜过程中,监测沉积速率和膜厚。并且利用这种方法,研究了真空沉积 Cds 膜的电学性质与沉积速率的关系,进一步研究了 Cu_2S/CdS 太阳能电池的性能与沉积速率的关系。
This article describes the simple improvement of quartz crystal monitoring method of film thickness. During the vacuum coating process, the deposition rate and film thickness were monitored over a film thickness range of 5 to 45 microns. The relationship between the electrical properties and the deposition rate of vacuum deposited Cds films was studied by this method. The relationship between the properties and the deposition rate of Cu 2 S / CdS solar cells was further studied.