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针对自由曲面无固定解析式的特点,根据感光材料的光化学作用原理,以及曝光能量与曝光深度的制约关系,提出采用变剂量曝光的光刻方法制作自由曲面光学微器件。从光传播理论出发,分析了曝光过程光刻胶中光能量分布规律和曝光深度随曝光能量的变化关系,建立了光分布规律的数学模型,并应用计算机软件对模型进行仿真。结果表明:光能量在胶膜内呈规律性分布,在能量一定的情况下曝光深度随时间规律性增加,并逐渐达到饱和。同时,应用长春理工大学BOL500型复合坐标激光直写系统,选用美国Futurrex62A光刻胶、波长412 nm He-Ge气体激光器、5‰NaOH显影液进行曝光及显影实验,所得实验数据与仿真结果吻合。
According to the photochemical principle of photosensitive material and the restriction of exposure energy and exposure depth, a free-form surface optical micro-device based on photolithography with variable dose exposure is proposed. Based on the theory of light propagation, the relationship between light energy distribution and exposure depth with the change of exposure energy was analyzed. A mathematical model of light distribution was established, and the model was simulated by computer software. The results show that the light energy is regularly distributed in the film, and the exposure depth increases regularly with time with a certain amount of energy and gradually reaches saturation. At the same time, the BOL500 compound coordinate laser direct writing system of Changchun University of Science and Technology was used. The exposure and development experiments were conducted using Futurrex62A photoresist, wavelength 412 nm He-Ge gas laser and 5 ‰ NaOH developer. The experimental data were in good agreement with the simulation results.