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通过对一系列１０６μｍＨｆＯ２／ＳｉＯ２全反膜样品进行的激光损伤阈值测试，以及二次离子质谱杂质含量测定的结果进行的比较分析，提出了减小膜系制备过程中杂质污染是提高光学薄膜激光损伤阈值行之有效的途径。将理论分析运用于具体生产实践中，获得了令人满意的结果。
Through the laser damage threshold test of a series of 106 μm HfO2 / SiO2 all-reflective film samples and the comparative analysis of the results of the secondary ion mass spectrometry impurity content, it is proposed to reduce the impurity contamination in the film-making process to improve the optical film Laser damage threshold effective way. The theoretical analysis applied to specific production practices, obtained satisfactory results.