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为满足离子注入材料改性研究和实际应用的需要。研制了一个金属蒸汽真空弧(简称MEVVA)离子源.这是一新型离子源种,它利用阴极和阳极间的真空弧放电原理由阴极表面直接产生高密度金属等离子体,经一多孔三电极系统引出得到强流金属离子束.该源脉冲工作方式,已引出Al,Ti,Fe,Cu,Mo和W等离子,脉冲离子束流强度为0.6～1.26A,Ti的平均束流强度已达10mA.引出束流大小与源的工作参数、引出结构和电压以及阴极材料有关。该源没有气体负载,工作真空度为3×10~(-4)Pa。
In order to meet the ion implantation material modification research and practical application needs. Developed a metal vapor vacuum arc (MEVVA) ion source.This is a new type of ion source, which uses the principle of vacuum arc discharge between the cathode and the anode directly from the cathode surface of high-density metal plasma generated by a porous three-electrode The system leads to get a strong current metal ion beam.The source pulse mode, has led to Al, Ti, Fe, Cu, Mo and W plasma, pulsed ion beam intensity of 0.6 ~ 1.26A, Ti average beam current intensity has reached 10mA The size of the outgoing beam is related to the operating parameters of the source, the resulting structure and voltage, and the cathode material. The source has no gas load, working vacuum degree of 3 × 10 ~ (-4) Pa.