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用磁控反应溅射法制备了ＺｎＯ：Ａｌ（简称ＺＡＯ）薄膜，研究了薄膜方块电阻空间分布的均匀性及微观形貌、并对ＺｎＯ：Ａｌ薄膜表面各元素的化学状态和深度分布进行了 ＸＰＳ和 ＡＥＳ分析，同时也讨论了薄膜的光学电学性能
The ZnO: Al (referred to as ZAO) thin films were prepared by magnetron reactive sputtering. The uniformity and microstructure of the films were investigated. The chemical states and depth distribution of ZnO: Al thin films were also studied. XPS and AES analysis, but also discussed the optical and electrical properties of the film