论文部分内容阅读
The impact of the fraction of germanium on the carrier performance of two-dimensional strained silicon, which embraces both the non-degenerate and degenerate regimes,is developed.In this model,the Fermi integral of order zero is employed.The impact of the fraction of germanium on the relaxed Si_(1-x)Ge_x substrate(x),carrier concentration and temperature is reported.It is revealed that the effect of x on the hole concentration is dominant for a normalized Fermi energy of more than three,or in other words the non-degenerate regime.On the contrary, the x gradient has less influence in the degenerate regime.Furthermore,by increasing x there is an increase in the intrinsic velocity,particularly with high carrier concentration and temperature.
The impact of the fraction of germanium on the carrier performance of two-dimensional strained silicon, which embraces both the non-degenerate and degenerate regimes, is developed. In this model, the Fermi integral of order zero is employed. Impact of the fraction of germanium on the relaxed Si_ (1-x) Ge_x substrate (x), carrier concentration and temperature is reported. It is revealed that the effect of x on the hole concentration is dominant for a normalized Fermi energy of more than three, or in other words the non-degenerate regime. On the contrary, the x-gradient has less influence in the degenerate regime. Fermentmore, by increasing x there is an increase in the intrinsic velocity, particularly with high carrier concentration and temperature.