研究了在真空电弧镀膜设备中产生纳米 Ti N颗粒沉降的临界条件。结果表明 ,当真空度P>8.7× 10 - 1 Pa,即 Knudsen数 Kn>110时 ,工作台中心几乎不能沉积 Ti N薄膜 ,而在真空反应气氛中有大量纳米 Ti N颗粒形成。增大反应气体的压力和提高负偏压 ,都可以进一步细化 Ti N颗粒。用 SEM和 XRD等测试方法对颗粒的形貌及结构进行了研究 ,在实验条件下纳米 Ti N颗粒的平均尺寸为 2 8～ 35 nm,其中有少量的 Ti颗粒存在 The critical conditions for the precipitation of nano-sized TiN particles in vacuum arc coating equipment were studied. The results show that when the vacuum degree P> 8.7 × 10 - 1 Pa, Knudsen number Kn> 110, almost no TiN film can be deposited in the center of the worktable, while a large amount of nano - TiN particles are formed in the vacuum reaction atmosphere. Increasing the pressure of the reaction gas and increasing the negative bias can further refine TiN particles. The morphology and structure of the particles were studied by SEM and XRD. Under the experimental conditions, the average size of nano-sized TiN particles was 28-35 nm, and a small amount of Ti particles existed