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利用深蚀刻二元光学理论和技术设计并制作了用于准分子激光器曝光系统的深蚀刻二元光学均匀器 .与原来使用的积分均匀器 (石英棒列阵 )相比 ,该均匀器具有重量轻 ,安装调控方便 ,光能利用率高 ,光束均匀性好等特点 .对该器件的设计性能和参数进行了研究、分析和计算机模拟 ;在高精度台阶仪上对所制作的深蚀刻二元光学均匀器进行了精密检测 ;用深蚀刻元件制作误差理论并引入“边界误差”概念 ,对元件的表面浮雕检测结果进行了深入的分析 .理论与实验结果符合得很好 .
A deep-etched binary optical homogenizer for an excimer laser exposure system was designed and fabricated using deep-etched binary optics theory and technology.The homogenizer has a weight of less than the original uniform integrator (quartz rod array) Light, easy to install and control, high utilization rate of light energy, good uniformity of light beam, etc .. The design performance and parameters of the device are studied, analyzed and simulated by computer; on the high precision stepper, Optical homogenizer was used to make a precise test. The theory of error was introduced into the deep etching device and the concept of “boundary error” was introduced to analyze the surface relief of the device in-depth.The theoretical and experimental results are in good agreement.