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The surface morphology and growth mechanism of an aluminum film system deposited on silicone oil surfaces by a vapor depositing method was investigated by scanning electron microscopy. It was found that the perpendicular fluctuation of the film’s bottom surface was more remarkable than that of the film’s top surface. Near the joint between the film on the silicone oil substrate and the film on the silicon wafer surface on which the silicone oil substrate rested, was a naturally formed anomalous wedge-shaped wrinkly structure with slopes of 10+{-4}-10+{-5} rad, whose growth mechanism could be interpreted under the assumption of the thermal expansion behavior of the liquid substrates.
The surface morphology and growth mechanism of an aluminum film system deposited on silicone oil surfaces by a vapor depositing method was investigated by scanning electron microscopy. It was found that the perpendicular fluctuation of the film’s bottom surface was more remarkable than that of the film’s top surface Near the joint between the film on the silicone oil substrate and the film on the silicon wafer surface on which the silicone oil substrate rested, was a naturally formed anomalous wedge-shaped wrinkly structure with slopes of 10 + {- 4 } - 10 + {- 5 } rad, whose growth mechanism could be interpreted under the assumption of the thermal expansion behavior of the liquid substrates.