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借助ＱＭＳ诊断技术，完成了ＨＬ－１Ｍ装置Ｂ化、Ｓｉ化和Ｌｉ涂覆壁的出气特性的对比实验研究。氦直流辉光放电清洗［ＧＤＣ（Ｈｅ）］期间，Ｈ２出气占支配地位，杂质分压与Ｈ２分压成正比，ＧＤＣ后的本底放气率较烘烤去气低。ＧＤＣ（Ｈｅ＋Ｈ２）是去除膜的有效方法。对应Ｂ化、Ｓｉ化和Ｌｉ涂覆壁，托卡马克放电后的Ｈ２出气量比是１∶０．１３∶０．２１。出Ｈ２量／送Ｈ２量对ＳＳ壁为０．５，对Ｂ化壁为１．８，对Ｓｉ化和Ｌｉ涂覆壁则为０．１。对ｎｅ归一化的出气量的Ｈ密度能有效地表示再循环系数（Ｒ）的大小。
By means of QMS diagnostic technique, comparative experiments on gas evolution properties of HL-1M devices with B, Si, and Li-coated walls were completed. H 2 out gas dominated during helium direct current glow discharge cleaning [GDC (He)]. The impurity partial pressure was proportional to the H2 partial pressure, and the background gassing rate after GDC was lower than that of the bake toe gas. GDC (He + H2) is an effective method to remove the membrane. The H2 outgassing ratio after tokamak discharge corresponds to 1: 0.13: 0.21 for B, Si and Li coated walls. The amount of H2 / amount of H2 delivered was 0.5 for SS wall, 1.8 for B wall and 0.1 for Si and Li wall. The H density of the normalized outflow to ne can effectively represent the size of the recirculation factor (R).