选取氮化硅和二氧化硅作为薄膜材料,借助膜系设计软件对膜系结构进行优化,采用中频脉冲磁控溅射技术进行薄膜制备。利用高反膜透射曲线拟合方法调整薄膜的实际沉积速率,减少膜厚控制误差,在树脂镜片CR39基底的凸面和凹面上分别镀制了符合设计要求的红外防护膜和可见光减反膜。镀膜后树脂镜片在420~680 nm的平均透过率大于95%,在近红外800~1400 nm波段的平均透过率小于60%,薄膜性能稳定,能够满足红外防护树脂镜片的日常使用需要。 Silicon nitride and silicon dioxide were selected as the thin film materials, and the film structure was optimized by means of film design software. The films were prepared by MF pulsed magnetron sputtering. The actual deposition rate of the film was adjusted by the high reflective film transmission curve fitting method to reduce the control error of the film thickness. An infrared protective film and a visible light antireflection film were respectively plated on the convex and concave surfaces of the resin lens CR39. The average transmittance of resin lenses after coating is more than 95% at 420 ~ 680 nm and less than 60% at 800 ~ 1400 nm in near infrared. The performance of the films is stable and can meet the daily needs of infrared protective resin lenses.