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利用直流磁控溅射工艺,在水冷玻璃衬底上成功沉积出了高透光、低电阻率的Ti-Al共掺ZnO(TAZO)透明导电薄膜。X射线衍射(XRD)研究结果表明,TAZO薄膜为具有c轴择优取向的六角纤锌矿结构多晶薄膜。研究了TAZO薄膜的应力、结构以及光电性能与薄膜厚度的关系,结果表明,当薄膜厚为531 nm时,薄膜晶格畸变最小,具有最小压应力(绝对值)0.726 6 Gpa,同时具有最小电阻率3.35×10-4Ω.cm,其光学带隙大约为3.58 eV。所制备薄膜附着性能良好,在波长为400~760 nm波段的可见光中平均透过率都超过了91%。
Ti-Al co-doped ZnO (TAZO) transparent conductive film with high transmittance and low resistivity was successfully deposited on a water-cooled glass substrate by DC magnetron sputtering. X-ray diffraction (XRD) results show that the TAZO film is a hexagonal wurtzite polycrystalline thin film with c-axis preferred orientation. The relationship between the stress, the structure and the photoelectric properties of the TAZO films was investigated. The results show that the lattice distortion of the films is the smallest with a minimum compressive stress (absolute value) of 0.726 6 Gpa at a film thickness of 531 nm, The rate of 3.35 × 10-4Ω.cm, the optical band gap is about 3.58 eV. The prepared films have good adhesion properties, and the average transmittance in the visible light with wavelength of 400-760 nm exceeds 91%.