A simple method using an 800-nm femtosecond laser and chemical selective etching is developed for fabrication of high-aspect-ratio grooves in silicon carbide.Micro grooves with an aspect ratio of approximately 40 are obtained.The morphology and chemical compositions of the grooves are analyzed using a scanning electronic microscope equipped with an energy dispersive x-ray spectroscopy.The formation mechanism of SiC grooves is attributed to the chemical reactions of the laser induced structural changes with a mixed solution of hydrofluoric acid and nitric acid.In addition,the effects of laser irradiation parameters on the aspect ratio of the grooves are investigated.