论文部分内容阅读
利用自行研制的石英钟罩式微波等离子体化学气相沉积金刚石薄膜装置，研究了硅基片的不同预处理方式对沉积结果的影响。通过扫描电子显微镜形貌观察和喇曼谱分析表明，基片预处理能提高形核密度；用于预处理的金刚石研磨膏的粒度不同，影响金刚石薄膜沉积时的形核密度、晶形和薄膜的质量；表面划痕对沉积金刚石薄膜的影响具有双重性。
The influence of different pretreatment methods of silicon substrate on the deposition results was studied by using a quartz bell jar microwave CVD CVD diamond thin film device developed by ourselves. Scanning electron microscopy and Raman spectroscopy analysis showed that the substrate pretreatment can improve the nucleation density. The particle size of the diamond paste used for pretreatment affects the nucleation density, the crystal form and the film Quality; surface scratches on the deposition of diamond film has a dual nature.