Characteristics of Cu implantation into Si by PBII using UBMS cathode

来源 :Transactions of Nonferrous Metals Society of China | 被引量 : 0次 | 上传用户:lubiaofs
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The implantation of Cu into Si substrate was carried out by plasma-based ion implantation (PBII) using unbalanced magnetron sputtering (UBMS) cathode as the metal plasma source. The different pulse bias (Up) and the distance between the cathode and the sa
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