,Digital LLRF controller for SSRF booster RF system upgrade

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The low level radio frequency(LLRF) system for booster accelerator at Shanghai Synchrotron Radiation Facility(SSRF) was upgraded by a digital controller based on field programmable gate array(FPGA) technology.Parameters of voltage, frequency and field flatness in the two 5-cell cavities are controlled to meet the requirements of booster. In this article, the ramping curve of cavity voltage, amplitude and phase control loop with vector sum of the two 5-cell cavities, tuning loop and field flatness loop are analyzed and discussed in detail.A different method in tuning loop is adopted due to the limitations of ADC channels. The function realizes energy ramping of electron beam from 150 Me V to 3.5 Ge V with a repetition rate of 2 Hz. With the new LLRF controller, the phase stability at ramping mode in 10 hours long operation is improved from ±1.5°(RMS) with open loop to ±0.15°(RMS) with close loop, while the detuning phase and field flatness are maintained to within ±2°and ±1%, respectively. The low level radio frequency (LLRF) system for booster accelerator at Shanghai Synchrotron Radiation Facility (SSRF) was upgraded by a digital controller based on field programmable gate array (FPGA) technology. Parameters of voltage, frequency and field flatness in the two 5- cell cavities are controlled to meet the requirements of booster. In this article, the ramping curve of cavity voltage, amplitude and phase control loop with vector sum of the two 5-cell cavities, tuning loop and field flatness loop are analyzed and discussed in detail . A different method in tuning loop is adopted due to the limitations of ADC channels. The function realizes energy ramping of electron beam from 150 Me V to 3.5 Ge V with a repetition rate of 2 Hz. With the new LLRF controller, the phase stability at a ramping mode of 10 hours long operation is improved from ± 1.5 ° (RMS) with open loop to ± 0.15 ° (RMS) with close loop, while the detuning phase and field flatness maintained within ± 2 ° and ± 1% res pectively.
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