材料表面改性领域的最新发展要求注离子改性范围在纳米量级,离子能量从几个eV到几百个eV,且必须具有强束流。通过离化团束(ICB)技术就可实现上述要求。 团粒是几十、几百或数千个原子或分子的聚合体,它很容易被电离和加速。1972年,Takagi等人通过一个喷嘴利用高温蒸发和膨胀进入真空形成了室温固体团粒,从此开始了离化团束沉积技术的发展。在常规离子束技术中采用原子或分子态离子,而离化团束采用电离的原子团。与单个原子束相比较,团粒束有不同的辐照效应,诸如沉积、溅射、损伤累积和动态退火等。团粒离子对材料的碰撞为表面处理 Recent developments in the field of material surface modification require that the ion implantation range be on the order of nanometers, ion energies from a few eV to hundreds of eV and must have strong beam currents. The above requirements can be met by ionization cluster (ICB) technology. Aggregates are polymers of tens, hundreds or thousands of atoms or molecules that are easily ionized and accelerated. In 1972, Takagi et al. Developed a technique of ionizing cluster deposition by using a nozzle to create a room-temperature solid agglomerate by high-temperature evaporation and expansion into a vacuum. In conventional ion beam technology, atomic or molecular ions are used, while ionized clusters use ionized atomic groups. Compared with a single atom beam, the particle beam has different irradiation effects, such as deposition, sputtering, damage accumulation and dynamic annealing. Pellet ions collide with the material for surface treatment