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利用引进的6 kW微波等离子体化学气相沉积设备,进行了无支撑金刚石膜工艺的初步研究。在800~1050℃的基片温度范围内,金刚石膜都呈(111)择优取向;基片相对位置对沉积较大面积、光学级金刚石膜至关重要。制出0.25 mm厚Φ50 mm的无支撑金刚石膜。拉曼光谱和X射线衍射分析表明,合成的金刚石膜晶体结构完整,sp2含量极低;透过率测试结果说明了优良的光学性能:截止波长225 nm,光学透过率(λ≥2.5μm)≥70%。
The introduction of 6 kW microwave plasma chemical vapor deposition equipment, a preliminary study of unsupported diamond film technology. In the temperature range of 800 ~ 1050 ℃, the diamond films are all preferentially oriented at (111). The relative position of the substrates is crucial for the deposition of large area, optical grade diamond films. A 0.25 mm thick Φ50 mm unsupported diamond film was made. Raman spectrum and X-ray diffraction analysis show that the crystal structure of the synthesized diamond film is intact and the content of sp2 is very low. The results of transmittance test show excellent optical properties: the cut-off wavelength is 225 nm, the optical transmittance (λ≥2.5 μm) ≥70%.