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研究了以稳定F-P腔腔长来控制原子沉积台与驻波光场之间相对位置的稳定性。在简要分析F-P腔工作原理的基础上,设计了F-P腔腔长锁定反馈控制系统。该系统以633nm稳频激光作为基准光源,通过光电转换、调制与解调、比例积分等控制环节,实现了将F-P腔的谐振频率锁定到基准光源的频率上。实验结果表明,锁定后的F-P腔腔长的稳定度达到了10-8以上,可满足原子光刻技术中对沉积台与驻波光场相对位置稳定的应用要求。
The stability of stabilizing the cavity length of F-P to control the relative position between the atomic deposition station and the standing wave optical field was studied. Based on the brief analysis of the working principle of F-P cavity, an F-P cavity length-locked feedback control system is designed. The system uses a 633nm frequency-stabilized laser as a reference light source, and achieves the locking of the resonant frequency of the F-P cavity to the frequency of the reference light source through control of photoelectric conversion, modulation and demodulation, proportional integral and the like. The experimental results show that the stability of F-P cavity length after locking is above 10-8, which can meet the application requirements of stable relative position of sedimentary station and standing wave optical field in atomic lithography.