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利用两种不同重均分子量的改性酚醛树脂(PF)与一种三个酯化度的四羟基二苯甲酮―重氮萘醌磺酸酯光敏剂(PAC)按比例配制,加入适量助剂优化感光性能,制备出一种应用于电子触屏加工领域的I-line正性光刻胶,其具有刻蚀精度高、工艺性能优良、单位成本较低等优势特点。
Using two different weight-average molecular weight modified phenolic resin (PF) and a three degree of esterification of tetrahydroxybenzophenone - diazonaphthoquinone sulfonate photosensitizer (PAC) in proportion to the preparation, by adding appropriate amount of help Agent to optimize the photosensitive properties, to prepare a kind of I-line positive photoresist used in the field of electronic touch screen processing, which has the advantages of high etching precision, excellent process performance and lower unit cost.