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针对传统制备导电薄膜工艺复杂、成本高,且在激光直写导电膜中存在所加入的辅料造成杂质污染以及膜的厚度和粗糙度难以降低等问题,本文采用玻璃衬底激光制备Zn/Al混合粉末生成导电薄膜,实现了无粘结剂和辅料的薄膜生成,研究了工艺参数调节对膜的生成质量的影响。结果表明,过低或过高的激光扫描速度都会使表面粗糙度增加,扫描速度过慢时薄膜表面被严重破坏,过快时导致附着不完全区域的出现;薄膜厚度随扫描速度变化,在表面附着的颗粒随扫描速度降低发生融合现象,膜厚将增大。优化参数后得到了粗糙度低于20nm、膜厚低于500nm的导电薄膜。
Aiming at the problems of the traditional preparation of conductive thin films, such as complicated process and high cost, and the impurities added in the laser direct write conductive film caused by the added materials and the difficulty in reducing the thickness and the roughness of the film, the glass substrate laser is used to prepare the Zn / Al mixture The conductive film was formed by powder, and the film formation without binder and auxiliary materials was realized. The influence of process parameters on the quality of film formation was studied. The results show that the laser scanning speed is too low or too high will make the surface roughness increases, the scanning speed is too slow when the film surface is severely damaged, too fast lead to incomplete attachment appears; film thickness with the scanning speed changes in the surface Attachment of the particles with the scanning speed decreases fusion occurs, the film thickness will increase. Optimized parameters obtained after the roughness of less than 20nm, the film thickness of less than 500nm conductive film.