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针对925银传统着黑色工艺存在的缺点,采用溅射镀膜与阳极层离子源相结合的镀膜工艺,在925银基底上镀覆Ti/DLC膜,检测了不同工艺参数下膜层的性能。结果表明,通过调整负偏压、工作气体分压及镀膜时间等工艺参数,可以使Ti/DLC膜层获得较纯正、有光泽的暗黑色,并可调节其显微硬度及临界划痕载荷;当负偏压为-120V、Ar气分压为0.40Pa、时间为10min时在925银基底上溅射Ti膜,以及负偏压为-180V,乙炔分压在0.25~0.30Pa、时间为40~45min在Ti膜上沉积DLC膜时,Ti/DLC膜层的外观装饰效果、耐蚀性和力学性能等较好。
Aiming at the shortcomings of 925 silver traditional black process, Ti / DLC film was coated on 925 silver substrate by the combination of sputtering and anode layer ion source, and the performance of the film under different process parameters was tested. The results show that by adjusting the parameters of negative bias voltage, partial pressure of working gas and coating time, the pure / glossy black of Ti / DLC film can be obtained and its microhardness and critical scratch load can be adjusted. When the negative bias voltage is -120V, the partial pressure of Ar gas is 0.40Pa, the Ti film is sputtered on a 925 silver substrate for 10min and the negative bias voltage is -180V, the partial pressure of acetylene is 0.25-0.30Pa and the time is 40 ~ 45min deposition of the DLC film on the Ti film, Ti / DLC film appearance decoration effect, corrosion resistance and mechanical properties are better.