利用电子束热蒸发技术在两种不同粗糙度的K9玻璃和一批单晶硅基底上沉积了单层二氧化钛(TiO_2)薄膜,并对这些样片进行了氧离子后处理。采用泰勒-霍普森相关相干表面轮廓粗糙度仪(Talysurf CCI)分别对基底以及样片处理前后的表面粗糙度进行了研究,并用椭偏仪对离子处理前后的TiO_2薄膜的折射率进行了测量。实验结果表明,TiO_2薄膜对于基底具有一定的平滑作用;当基底粗糙度较大时,随着轰击离子能量的增加样片的表面粗糙度先减小后增加;当氧离子的轰击时间增加时,薄膜表面粗糙度会明显降低,随着轰击离子束流密度的增加,薄膜表面的粗糙度减小的幅度会增加。 Single layer titanium dioxide (TiO_2) thin films were deposited on K9 glass and monocrystalline silicon substrates with two different roughness by electron beam thermal evaporation technique. The samples were subjected to oxygen ion post-treatment. The surface roughness of the substrates and samples before and after treatment were studied by using the Taylor-Hopson correlation coherence surface profilometer (Talysurf CCI). The refractive indices of TiO 2 films before and after ion treatment were measured by ellipsometry. The experimental results show that the TiO 2 film has a certain smooth effect on the substrate. When the roughness of the substrate is large, the surface roughness of the sample first decreases and then increases with the increase of the bombardment ion energy. When the bombardment time of oxygen ions increases, Surface roughness will be significantly reduced, with the increase of bombardment ion beam current density, the surface roughness of the film will decrease the magnitude of increase.