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根据惯性约束聚变分解实验的要求 ,通过激光干涉法在光刻胶表面制备正弦起伏图形 ,结合电镀图形转移工艺 ,获得了波长 2 0～ 10 0 μm、振幅 0 2～ 3 5 μm的一系列Ni基图形转移模板 ,并进一步将正弦起伏图形转移到聚苯乙烯薄膜表面 ,制备出聚苯乙烯二维调制箔靶。研究了图形的精确转移工艺 ,特别是深振幅样品的脱模工艺 ,对工艺参数的优化进行了讨论。采用台阶仪和原子力显微镜监控图形转移过程 ,比较了光刻胶表面图形和一次、二次电镀转移图形以及转移到聚苯乙烯薄膜上图形的形貌 ,测定了图形转移过程中的深度变化
According to the requirement of inertial confinement fusion decomposition experiment, the laser undisturbed method was used to fabricate a sinusoidal undulating pattern on the surface of the photoresist, and a series of Ni with wavelength of 20 ~ 100 μm and amplitude of 0 2 ~ 35 μm were obtained by electroplating pattern transfer technology Based pattern transfer template, and further sinusoidal fluctuation pattern transferred to the polystyrene film surface, prepared two-dimensional modulation of polystyrene foil target. The precise transfer process of the pattern, especially the stripping process of the deep amplitude sample, was studied. The optimization of process parameters was also discussed. The step-by-step and atomic force microscopy were used to monitor the pattern transfer process. The surface morphology of the photoresist, the pattern of primary and secondary plating transfer and the morphology of the pattern transferred to the polystyrene film were compared. The depth changes during the pattern transfer were measured.