Growth characteristics of MoS2 coatings prepared by unbalanced bipolar DC magnetron sputtering

来源 :中国有色金属学会会刊：英文版 | 被引量 : 0次 | 上传用户：zxjds

【摘要】

：

MoS2 coatings were prepared by unbalanced bipolar DC magnetron sputtering under different argon pressures and for different deposition times, and the structure

【作者】

：

王吉会夏扬 E. Wieers L. M. Stals J

【机构】

：

SchoolofMaterialsScienceandEngineering,InstituteforMaterialsResearch,DepartmentofMTM

【出处】

：

中国有色金属学会会刊：英文版

【发表日期】

：

2005年6期

【关键词】

：

磁控反应溅射二硫化钼涂层生长机制 XRD magnetron sputtering molybdenum disulfide （MoS2） coati

【基金项目】

：

教育部留学回国人员科研启动基金

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MoS2 coatings were prepared by unbalanced bipolar DC magnetron sputtering under different argon pressures and for different deposition times, and the structure and morphology of MoS2 coatings were determined and observed respectively by X-ray diffractomet

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Growth characteristics of MoS2 coatings prepared by unbalanced bipolar DC magnetron sputtering

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