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采用MEVVA离子源复合磁控溅射沉积系统,在钛合金Ti6Al4V基体上制备Ti掺杂DLC薄膜,研究Ti掺杂对DLC薄膜疏水性能的影响。通过X射线能谱仪(EDS)、X射线光电子谱(XPS)、原子力显微镜(AFM)分别对薄膜的组分、化学键以及表面形貌进行分析;通过测量静态接触角分析薄膜的润湿性并计算薄膜的表面能。结果表明:Ti掺杂DLC膜明显提高疏水性能,水接触角最高达到105°。薄膜中sp2C杂化键组分增加以及表面形成Ti-O键,是导致薄膜表面能降低的重要因素。
A MEVVA ion source composite magnetron sputtering deposition system was used to fabricate Ti-doped DLC films on Ti6Al4V substrate. The effects of Ti doping on the hydrophobic properties of DLC films were investigated. The composition, chemical bond and surface morphology of the films were analyzed by X-ray photoelectron spectroscopy (EDS), X-ray photoelectron spectroscopy (XPS) and atomic force microscope (AFM) respectively. The wettability of the films was also analyzed by measuring the static contact angle Calculate the surface energy of the film. The results show that the DLC film doped with Ti significantly improves the hydrophobicity and the water contact angle reaches 105 °. The increase of the sp2C hybrid bond and the formation of Ti-O bond on the surface of the film are the important factors leading to the decrease of the surface energy of the film.