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应用Auger电子能谱（AES）,X射线光电子能谱（XPS）和程序升温热脱附谱（TDS）研究了SmOx/Rh（100）模型表面的制备及CO在该表面的吸附.Sm和氧的强亲合作用引起了Sm在表面的强烈偏析.氧化表面的高温热处理,导致 SmOx在 Rh（100）表面的进一步聚集.与 120K吸附在清洁 Rh（100）表面的CO的热脱附谱相比较,吸附在 SmOx/Rh（100）表面的 CO的热脱附谱中在 176,331和 600 K出现了新的脱附峰.其中位于 176 K的脱附峰可归属于吸附在 SmOx岛上的 CO的脱附,而位于 331,600 K的脱附峰的出现与表面Sm原子的氧化程度有关,可分别归属为吸附在富氧和贫氧SmOx岛周边界面Rh原子上的CO的脱附.
The preparation of SmOx / Rh (100) model surface and the adsorption of CO on this surface were investigated by Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS) and temperature programmed desorption spectroscopy (TDS) Strong affinity of Sm caused the strong segregation of Sm on the surface.The high temperature heat treatment of the oxidized surface resulted in the further aggregation of SmOx on the Rh (100) surface.The thermal desorption profile of CO adsorbed on the surface of clean Rh (100) In comparison with the thermal desorption spectra of CO adsorbed on the surface of SmOx / Rh (100), new desorption peaks appeared at 176,331 and 600 K. Among them, the desorption peak at 176 K belongs to the CO adsorbed on the SmOx island And the appearance of the desorption peak at 331,600 K is related to the degree of oxidation of surface Sm atoms and can be attributed respectively to the desorption of CO adsorbed on the Rh atoms at the interface between the oxygen-rich and oxygen-lean SmOx islands.