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我们研制了一套以微电子光刻为应用背景的紧凑型高重复率、高性能、工作气体为氖气的等离子焦点装置(NX2 )做为软 X射线源。其储能电容由四组电容器组成。每一组又包括 12个并联的 0 .6 μF电容器 ,共用一个轨道式开关。充电电压为 11.5 k V时 ,其峰值电流可达 4 0 0 k A。该装置中采用水冷式电极与真空室设计 ,以 16 Hz重复率连续运行几分钟产生 30 0 W的软 X射线。初步的光刻实验结果表明连续放电 30 0次便可取得足够软 X射线暴光量
We developed a compact, high repetition rate, high performance, neon-based plasma focus device (NX2) based on microelectronics lithography for use as a soft X-ray source. The storage capacitor consists of four capacitors. Each group also includes 12 parallel 0.6 μF capacitors, share a track switch. At a charge voltage of 11.5 kV, the peak current can reach 400 kA. Designed with water-cooled electrodes and a vacuum chamber, this unit operates at a repetition rate of 16 Hz for a few minutes to produce 30 W of soft X-rays. The preliminary photolithographic results show that 30 times of continuous discharge can be obtained enough soft X-ray exposure