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利用微波等离子体化学气相沉积(MWPCVD)方法,在刻线的镍膜上沉积碳纳米管膜。通过SEM和拉曼光谱表征,讨论了催化剂厚度、制备温度、反应时间以及甲烷浓度对碳纳米管场发射的影响。结果表明:不同条件下制备的碳纳米管的场发射性能有很大差异,保持氢气的流量(100sccm)不变,当甲烷流量为5sccm、生长时间为5min、催化剂膜厚为150nm、温度为700～800℃时,场发射性能最好,开启场强为1.3V/μm,最大发射电流达到6.8mA/cm2。
Carbon nanotube films were deposited on scribed nickel films using a microwave plasma chemical vapor deposition (MWPCVD) method. The effects of catalyst thickness, preparation temperature, reaction time and methane concentration on the field emission of carbon nanotubes were discussed by SEM and Raman spectroscopy. The results show that the field emission properties of carbon nanotubes prepared under different conditions are very different, keeping the flow rate of hydrogen (100sccm) constant. When the flow rate of methane is 5sccm, the growth time is 5min, the catalyst film thickness is 150nm and the temperature is 700 ~ 800 ℃, the field emission performance is the best, the field strength is 1.3V / μm and the maximum emission current is 6.8mA / cm2.