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主要运用多弧离子镀技术研究了偏压对不锈钢基片上镀制的TiN膜层的影响,运用扫描电子显微镜(SEM),X-射线衍射仪(XRD)和附着力测定仪研究了膜表面的钛滴、针孔、膜的取向和临界载荷等性能。结果表明:低偏压下膜表面的针孔密度较小,高偏压下钛滴趋于细化。划痕试验表明:在150～200V偏压下膜层的临界载荷最佳。
The effects of bias voltage on TiN coating on stainless steel substrate were mainly studied by using multi-arc ion plating technology. The effects of bias voltage on TiN coating on stainless steel substrates were studied by scanning electron microscopy (SEM), X-ray diffraction (XRD) and adhesion tester Titanium drop, pinhole, film orientation and critical load and other properties. The results show that the pinhole density on the surface under the low bias is small, and the titanium droplets tend to be thinned under high bias. Scratch tests show that the critical load of the film is the best under bias of 150 ~ 200V.