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目前,作为集成电路以及纳米加工主流工艺的光学光刻技术,由于其受到光学衍射极限的物理限制,在16nm线宽及其以下节点的结构制造中,其技术复杂性和设备制造成本大大增加。纳米压印作为一种高分辨率、高效率、低成本和操作过程简单的技术,引起了各国研究人员的广泛关注。然而纳米压印中不可避免引入的机械压力又会引发纳米结构几何变形、变尺寸结构填充不均匀等问题。本项目针对常规纳米压印存在的问题,基于介电聚合物的电流体动力学行为研究,提出了利用电场力替代机械力的电驱动模塑技术,在保持纳米压印突出优势的前提下,克服或避免了机械压力引发的技术性难题,成功实现了15nm节点结构的高保真复型以及深宽比8的大深宽比纳米结构成型。
Currently, as an integrated circuit and the mainstream of nano-fabrication process of optical lithography technology, due to its physical limitations by the optical diffraction limit, the 16nm line width and below the node structure manufacturing, the technical complexity and equipment manufacturing costs greatly increased. As a technology of high resolution, high efficiency, low cost and simple operation, nanoimprint attracts the researchers in many countries. However, the mechanical pressure that is inevitably introduced in the nanoimprint will cause the geometric deformation of the nano-structure and the uneven packing of the variable-size structure. In this project, aiming at the problems existing in conventional nanoimprint, based on the study of the electrohydrodynamic behavior of dielectric polymer, electric driving molding technology using electric force instead of mechanical force was put forward. Under the premise of keeping prominence of nanoimprint, Overcome or avoid the mechanical pressure caused by the technical problems, the successful realization of the 15nm node structure of high-fidelity complex and aspect ratio aspect ratio of 8 large aspect ratio nano-structure.