离子渗氮工艺早在本世纪三十年代初就由德国威尔纳和贝尔格豪斯在气体放电中进行试验。但是限于当时电子技术发展水平,未能在大电流辉光放电条件下稳定工作,致使这一新技术迟迟没有在生产上获得应用。直至五十年代束,六十年代初,随着电子技术的迅速发展及对离子渗氮技术研究的逐渐深入;灭弧技术和阴极电结构等一系列问题相继得到解决,工艺究也日趋成熟,对于离子渗入机理及其微观过程研究也做了大量深入细致工作,这些 Ion nitriding process as early as the early 1930s by Germany Werner and Berg House in the gas discharge test. But limited to the level of development of electronic technology at that time, failed to work stably under the conditions of high-current glow discharge, resulting in the delayed application of this new technology in production. Until the 1950s and the early 1960s, with the rapid development of electronic technology and the research on ion nitriding technology, a series of problems such as interrupting technology and cathodic electricity structure have been solved one after another, A great deal of in-depth and meticulous work has also been done on the mechanism of ion infiltration and its microscopic process, and these