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采用射频磁控溅射制备不同V含量的CrSiVN薄膜。利用X射线衍射、扫描电镜、X射线能量色散谱、纳米压痕仪和摩擦磨损实验对薄膜的相结构、形貌、成分和摩擦性能进行分析。结果表明,CrSiVN薄膜为fcc结构,具有(200)择优取向。薄膜晶格常数受V含量的影响不大。随V含量的增加,薄膜晶粒尺寸逐渐升高,显微硬度逐渐降低。由于在磨痕表面生成了具有润滑作用的氧化物,薄膜体现出较低的平均摩擦系数。
CrSiVN films with different V content were prepared by RF magnetron sputtering. The phase structure, morphology, composition and tribological properties of the films were analyzed by X-ray diffraction, scanning electron microscopy, X-ray energy dispersive spectroscopy, nanoindentation and friction and wear tests. The results show that the CrSiVN film has a fcc structure and has a preferred orientation of (200). The lattice constant of the thin film is not greatly influenced by the content of V. With the increase of V content, the grain size of the film gradually increased, and the microhardness gradually decreased. The film shows a lower average coefficient of friction due to the formation of a lubricated oxide on the surface of the wear scar.