根据Al及其合金的极化曲线来调节时间和电流密度,确定其工艺参数并进行电解抛光,阐述阳极氧化膜的成长机理及生长过程,讨论了氧化时间与膜厚的关系。结果表明:低电压、小电流密度时电解抛光效果比较好,在一定时间范围内,阳极氧化膜随时间的延长而增厚;并且对膜表面进行XRD的成分分析发现,膜表面含有一定的非晶态和晶态Al2O3。 According to the polarization curves of Al and its alloys, the time and current density were adjusted, the process parameters were determined and the electrolytic polishing was carried out. The growth mechanism and growth process of the anodic oxide film were described. The relationship between the oxidation time and the film thickness was discussed. The results show that the electrolysis polishing effect is better under low voltage and low current density, and the anodic oxide film thickens with the extension of time within a certain time range. And the composition analysis of the film surface by XRD shows that the surface of the film contains a certain amount of non- Crystalline and crystalline Al2O3.