为了了解在抛光过程中抛光盘位置对光学元件面形的影响,对一种双轴式平面研磨抛光运动过程进行了分析。从Preston方程出发,推导了去除函数的表达式,研究了抛光盘的摆幅及偏心距离对元件的去除量分布的影响。通过定量计算得知,在加工转速不变的情况下,增大抛光盘的摆幅,元件不同圆周上的去除量也不同。增大偏心距,元件的去除量增大,不论抛光盘相对元件的位置如何改变,回转中心的去除量总是最大。 In order to understand the influence of the position of the polishing disc on the surface of the optical element during the polishing process, a biaxial plane polishing process was analyzed. Based on the Preston equation, the expression of the removal function is deduced. The influence of the swinging distance and the eccentric distance of the polishing disc on the component removal is studied. Through quantitative calculation, we can see that under the condition of constant processing speed, the swinging of the polishing disc is increased and the removal amount on the different circles of the components is also different. Increasing the eccentricity, the removal of components increased, regardless of the relative position of the disc to change the location of elements, the removal of the rotation center is always the largest.